RHH series RF power supply relies on mature RF generation technology to provide customers with RF power supply with greater power, higher precision and fast response. With phase can be set, pulse controllable, digital tuning and other functions. Applicable fields: photovoltaic industry, flat panel display industry, semiconductor industry, chemical industry, laboratory, scientific research, manufacturing, etc.
Applicable processes: plasma enhanced chemical vapor deposition (PECVD), plasma etching, plasma cleaning, radio frequency ion source, plasma diffusion, plasma polymerization sputtering, reactive sputtering, etc.
● Adopt full digital control, with convenient and rich operation menu
● Frequency tuning, pulse and pulse synchronization functions
● With CEX phase synchronization function
● Perfect protection function
Input | Input voltage: AC220V±10% 3ΦAC380V±5%(Special specifications can be customized) |
Input frequency: 47~63Hz | |
Output | Output frequency: 13.56MHz、27.12MHz、40.68MHz |
Tuning range: ±5% | |
Output power: 1.5~5kW | |
Regulation range of output power: 1~100% | |
Output impedance: 50Ω+j0 | |
Output interface: type N | |
Output mode: continuous, pulse | |
Pulse frequency: 100Hz~100kHz | |
Duty cycle: 5~95% | |
Performance index | Power factor: 0.98 |
Frequency stability accuracy: ±0.005% | |
Efficiency: 75% (at rated output) | |
Harmonic: ＜-45dBc | |
Stray: ＜-50dBc | |
External control interface: analog quantity, communication and synchronization | |
Communication mode: Standard RS485 communication interface; Optional Ether CAT, industrial Ethernet, etc. |
Acess the ful technicaldocumentation for the HanYuan distributed charging system, including power cabinet and dispenserspecifications, dimensions,connector options,and installation requirements.
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