Mana RF

Hilinaʻi ka lako mana RF moʻo RHH i ka ʻenehana hanauna RF makua e hāʻawi i nā mea kūʻai aku me ka lako mana RF me ka mana nui aʻe, ka pololei kiʻekiʻe a me ka pane wikiwiki. Hiki ke hoʻonohonoho ʻia me ka pae, ka pulse controllable, ka hoʻonohonoho kikohoʻe a me nā hana ʻē aʻe. Nā kahua pili: ʻoihana photovoltaic, ʻoihana hōʻike panela pālahalaha, ʻoihana semiconductor, ʻoihana kemika, keʻena hoʻokolohua, noiʻi ʻepekema, hana ʻana, a pēlā aku.
Nā kaʻina hana pili: plasma enhanced chemical vapor deposition (PECVD), plasma etching, plasma cleaning, radio frequency ion source, plasma diffusion, plasma polymerization sputtering, reactive sputtering, etc.