Ubonelelo lwaMandla e-RF/Sputtering

Ubonelelo lwamandla e-RF lwe-RHH luxhomekeke kubuchwepheshe bokuvelisa i-RF obuvuthiweyo ukubonelela abathengi ngobonelelo lwamandla e-RF ngamandla amakhulu, ukuchaneka okuphezulu kunye nempendulo ekhawulezayo. Iseti yesigaba inokuseta, i-pulse iyalawuleka, ukulungiswa kwedijithali kunye neminye imisebenzi. Iindawo ezisebenzayo: ishishini le-photovoltaic, ishishini lokubonisa iphaneli ethe tyaba, ishishini le-semiconductor, ishishini leekhemikhali, ilabhoratri, uphando lwesayensi, imveliso, njl.
Iinkqubo ezisebenzayo: i-plasma enhanced chemical vapor deposition (PECVD), i-plasma etching, ukucocwa kwe-plasma, umthombo we-ion yerediyo, ukusasazeka kwe-plasma, i-plasma polymerization sputtering, i-reactive sputtering, njl.

Umbane we-RF series RLS usebenzisa i-amplifier yamandla ezinzileyo nethembekileyo yangoku kunye nenkqubo yolawulo lwe-DC yenkampani, ukuze imveliso ibe nokusebenza okuzinzileyo kakhulu kunye nokuthembeka okuphezulu kwemveliso. Sebenzisa ujongano lokubonisa lwesiTshayina nesiNgesi, kulula ukuyisebenzisa. Isetyenziswa kakhulu kushishino lwe-photovoltaic, kushishino lokubonisa iiphaneli ezisicaba, kushishino lwe-semiconductor, kushishino lweekhemikhali, kwilebhu, kuphando lwesayensi, kwimveliso, njl.

Ingahlengahlengiswa kwi-RLS series RF power supply, kwaye isetyenziswa kakhulu kwi-plasma etching, coating, plasma cleaning, plasma degumming kunye nezinye iinkqubo. Xa isetyenziswa yodwa, ingasetyenziswa kunye nezinye izixhobo zamandla ze-RF zabenzi.

Umbane we-MSD series DC sputtering usetyenziswa yinkqubo yolawulo lwe-DC yenkampani edityaniswe nesicwangciso esihle kakhulu sokucubungula i-arc, ukuze imveliso ibe nokusebenza okuzinzileyo, ukuthembeka okuphezulu kwemveliso, umonakalo omncinci we-arc kunye nokuphindaphinda okuhle kwenkqubo. Sebenzisa ujongano lokubonisa lwesiTshayina nesiNgesi, kulula ukuyisebenzisa.