Sapalai Malosiaga RF/Sputtering

O le sapalai eletise RF o le faasologa RHH e faalagolago i tekinolosi gaosiga RF ua leva e tuuina atu ai i tagata faatau le sapalai eletise RF ma le malosi sili atu, sa'o maualuga ma tali vave. Faatasi ai ma le vaega e mafai ona setiina, pulea le pulse, setiina numera ma isi galuega. Vaega talafeagai: alamanuia photovoltaic, alamanuia faaaliga laupapa mafolafola, alamanuia semiconductor, alamanuia vailaau, fale suesue, suesuega faasaienisi, gaosiga, ma isi.
Fa'agasologa talafeagai: plasma enhanced chemical vapor deposition (PECVD), plasma etching, plasma cleaning, radio frequency ion source, plasma diffusion, plasma polymerization sputtering, reactive sputtering, ma isi.

O le sapalai eletise RF o le faasologa o le RLS e faʻaaogaina le faʻamalosi eletise mautu ma faʻatuatuaina o loʻo iai nei ma le faiga autu o le pulea o le DC a le kamupani, ina ia maua ai e le oloa se faʻatinoga mautu ma le faʻatuatuaina maualuga o oloa. E faʻaaogaina le faʻaaliga faʻa-Saina ma le Igilisi, faigofie ona faʻagaoioia. E masani ona faʻaaogaina i le alamanuia photovoltaic, alamanuia faʻaaliga laupapa mafolafola, alamanuia semiconductor, alamanuia vailaʻau, fale suʻesuʻe, suʻesuʻega faasaienisi, gaosiga, ma isi mea faapena.

E mafai ona fetu'una'i i le sapalai eletise RF o le faasologa o le RLS, ma e lautele lona fa'aaogaina i le etching plasma, coating, plasma cleaning, plasma degumming ma isi faiga. A fa'aaogaina na'o ia, e mafai ona fa'aaogaina fa'atasi ma sapalai eletise RF a isi gaosi oloa.

O le sapalai eletise sputtering DC fa'asologa a le MSD e fa'aaogaina le faiga fa'atonutonu DC autu a le kamupani fa'atasi ai ma le faiga sili ona lelei o le fa'agasologa o le arc, o lea e mautu ai le fa'atinoga o le oloa, maualuga le fa'atuatuaina o oloa, la'ititi le fa'aleagaina o le arc ma lelei le toe faia o le fa'agasologa. E fa'aaogaina le fa'aaliga fa'a-Saina ma le Igilisi, faigofie ona fa'agaoioia.