RF/Sputtering Power Supply

RHH series RF power supply relies on mature RF generation technology to provide customers with RF power supply with greater power, higher precision and fast response. With phase can be set, pulse controllable, digital tuning and other functions. Applicable fields: photovoltaic industry, flat panel display industry, semiconductor industry, chemical industry, laboratory, scientific research, manufacturing, etc.
Applicable processes: plasma enhanced chemical vapor deposition (PECVD), plasma etching, plasma cleaning, radio frequency ion source, plasma diffusion, plasma polymerization sputtering, reactive sputtering, etc.

The RLS series RF power supply adopts the current stable and reliable power amplifier and the company’s core DC control system, so that the product has very stable performance and high product reliability. Adopt Chinese and English display interface, easy to operate. Mainly used in photovoltaic industry, flat panel display industry, semiconductor industry, chemical industry, laboratory, scientific research, manufacturing, etc.

It can be adapted to RLS series RF power supply, and is widely used in plasma etching, coating, plasma cleaning, plasma degumming and other processes. When used alone, it can be used together with other manufacturers’ RF power supplies.

MSD series DC sputtering power supply adopts the company’s core DC control system combined with excellent arc processing scheme, so that the product has very stable performance, high product reliability, small arc damage and good process repeatability. Adopt Chinese and English display interface, easy to operate.