Ike RF/Sputtering

Ọkụ ike RF usoro RHH dabere na teknụzụ mmepụta RF tozuru oke iji nye ndị ahịa ike RF ka mma, nkenke ka mma na nzaghachi ngwa ngwa. Enwere ike ịtọlite ​​​​usoro, njikwa pulse, nhazi dijitalụ na ọrụ ndị ọzọ. Ubi ndị dị mkpa: ụlọ ọrụ fotovoltaic, ụlọ ọrụ ngosipụta panel dị larịị, ụlọ ọrụ semiconductor, ụlọ ọrụ kemịkalụ, ụlọ nyocha, nyocha sayensị, mmepụta ihe, wdg.
Usoro ndị dị mkpa: ntinye plasma emelitere vapor chemical deposition (PECVD), nhazi plasma, nhicha plasma, isi iyi ion redio frequency, mgbasa plasma, sputtering plasma polymerization, reactive sputtering, wdg.

Ọkụ ike RLS usoro RF na-anabata ihe na-eme ka ike kwụsie ike ma dịkwa mma nke dị ugbu a yana sistemụ njikwa DC isi nke ụlọ ọrụ ahụ, nke mere na ngwaahịa ahụ nwere arụmọrụ kwụsiri ike na ntụkwasị obi dị elu nke ngwaahịa ahụ. Nabata njikọ ngosipụta nke China na Bekee, dị mfe ịrụ ọrụ. A na-ejikarị ya eme ihe na ụlọ ọrụ fotovoltaic, ụlọ ọrụ ngosi panel dị larịị, ụlọ ọrụ semiconductor, ụlọ ọrụ kemịkalụ, ụlọ nyocha, nyocha sayensị, mmepụta ihe, wdg.

Enwere ike ime ka ọ dabara na RLS usoro RF power supply, a na-ejikwa ya eme ihe n'ọtụtụ ebe na plasma etching, mkpuchi, nhicha plasma, degumming plasma na usoro ndị ọzọ. Mgbe ejiri ya naanị ya, enwere ike iji ya na RF power supply nke ndị nrụpụta ndị ọzọ.

MSD usoro DC sputtering ike ọkọnọ na-anabata sistemụ njikwa DC isi nke ụlọ ọrụ ahụ yana atụmatụ nhazi arc dị mma, nke mere na ngwaahịa ahụ nwere arụmọrụ kwụsiri ike, ntụkwasị obi dị elu na ngwaahịa dị elu, obere mmebi arc na ezigbo mmegharị usoro. Nabata interface ngosipụta nke China na Bekee, dị mfe iji.